Instytut Materiałoznawstwa i Mechaniki Technicznej
oraz
Centrum Doskonałości Sol-Gel Materials and Nanotechnology
Serdecznie zapraszają na połączone konferencje: „Nanotechnolgia i Materiały Zol-Żelowe”
„Trzecie Kolokwium Czesko-Śląsko-Saksońskie z Mechaniki”

które odbędą się w dniach 21-22 listopada 2005 W Hotelu Park Plaza, ul. Drobnera 11-13.

Monday, November 21
13:15 – 13:30 Welcome, Scope of the workshop (K. Maruszewski, E. Zschech)
13:30 – 14:30 Overview talk (J. Felba, TU Wroclaw)
14:30 – 15:00 Looking for simple and inexpensive methods of fabrication and analysis of 2D photonics crystals (S. Patela, TU Wroclaw)
15:00 – 15:30 Break
15:30 – 16:00 Microsystem application of LTCC (Low Temperature Cofired Ceramics) technology (L. Golonka, TU Wroclaw)
16:00 – 16:30 Scaling of nonvolatile memories to nanoscale feature sizes (T. Mikolajick, Infineon Technologies, Dresden)
16:30 – 17:00 Preparation of epsilon-Fe₂O₃ and its interesting magnetic properties (D. Niznansky, Karol University, Prague)
19:00 Dinner

Tuesday, November 22
9:00 – 9:30 Porous sol-gel materials (K. Maruszewski, TU Wroclaw)
9:30 – 10:00 Nanoscaled multilayers for EUV lithography and analytical purposes (S. Braun, Faunhofer Institute IWS, Dresden)
10:00 – 10:30 Break
10:30 – 11:00 Strain in silicon – measuring strategies (M. Hecker, H. Geisler, AMD Saxony, Dresden)
11:00 – 11:30 Experimental challenges for NanoRaman spectroscopy (L. Zhu, University Ulm, P. Dudek, TU Wroclaw, M. Hecker, AMD Saxony Dresden)
11:30 – 12:00 FIB preparation and characterization of nanostructures (Y. Ritz, M. Hecker, E. Zschech, AMD Saxony, Dresden)
12:00 – 12:30 AFM method in nanotechnology (T. Gotszalk, TU Wroclaw)
12:30 – 13:00 Concluding remarks (K. Maruszewski, E. Zschech)
13:00 – 14:00 Lunch
14:00 – 16:00 Lab tour